Study of Contact Resistances in Integrated Circuits
Study of Contact Resistances in Integrated Circuits
- New search for: Buehler, M. G.
- New search for: Lambe, J.
- New search for: Suszko, S. F.
- New search for: Buehler, M. G.
- New search for: Lambe, J.
- New search for: Suszko, S. F.
Techniques explored in search for rapid, reliable test. Resistances of aluminum/silicon contacts and methods to measure subjects of NASA report. Study with three tasks undertaken to evaluate nature and reliability of large numbers of semiconductor contacts of type now being fabricated in integrated circuits: Develop yield analysis for series strings of contacts using wafer-level electrical measurements, and identify different types of faults by visual inspection; develop wafer-level tests to evaluate reliability of contact strings; and develop mathematical model for current flow in contacts and examine contact region for evidence of micro-alloying.
Document information
Study of Contact Resistances in Integrated Circuits
NASA Tech Briefs ; 9 , 2
1985-10-01
Miscellaneous
No indication
English
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