Present and future industrial metrology needs for qualification of high-quality optical microlithography materials (Invited Paper) [4449-01]

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Present and future industrial metrology needs for qualification of high-quality optical microlithography materials (Invited Paper) [4449-01]

Engel, A. / Morsen, E. / Jordanov, A. / Knapp, K. / SPIE

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Title :

Present and future industrial metrology needs for qualification of high-quality optical microlithography materials (Invited Paper) [4449-01]

Contributors:

Engel, A. (author) / Morsen, E. (author) / Jordanov, A. (author) / Knapp, K. (author) / Duparre, A. / Singh, B. / SPIE

Conference:

Conference; 2nd, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2001 ; San Diego, CA

Published in:

Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 1-6

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERINGG ; 4449

Publication date :

2001-01-01

Size :

6 pages

ISBN :

0819441635

ISSN :

0277-786X

Type of media :

Conference paper

Type of material :

Language :

English

Keywords :

optical metrology , semiconductor industries , data storage industries

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