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Excimerlaser
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Excimer lasers, optics, and applications : 12-13 February 1997, San Jose, California
Excimer laser materials processing and beam delivery systems : 8 - 9 November 1990, Boston, Mass.
Excimer laser machining of advanced materials [2992-17]
Optimization of 200-W excimer laser for TFT annealing [2992-05]
Morphological surface change of elastomers by excimer laser ablation [2992-18]
Small excimers opening up new industrial applications [2992-02]
UV and gas interactions in an enclosed 193-nm excimer laser beamline [2992-07]
Processing applications with the 157-nm fluorine excimer laser [2992-15]
Excimer lasers for material ablation cross the 1.5 kHz mark (Invited Paper) [2992-01]
General machining concept for producing micro-optics with high-power UV lasers [2992-22]
Surface texturing of aluminum alloy 2024 via excimer laser irradiation [2992-14]
Excimer ablation lithography (EAL) for TFT-LCD (Invited Paper) [2992-16]
Excimer-laser-irradiated phase masks for grating formation [2992-21]
High-average-power picosecond-pulse excimer laser system for x-ray generation [2992-06]
Coaxial, cylindrical, and planar UV excilamps pumped by glow or barrier discharge [2992-04]