Accurate sizing of deposited PSL spheres from light scatter measurements [4449-19]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Atomic Force Microscopy: AFM helps engineer low-scatter thin films
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Effects of particle shape on particle identification and scatter predictions [4449-18]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
Measurement of the elastic constants of nanometric films [4449-16]