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DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Microroughness analysis of thin film components for VUV applications [4099-13]
Penentuan Jumlah Kendaraan Transjogja Dengan Metode Simulasi
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
The role of the space industry in building capacity in emerging space nations
Drónok alkalmazási lehetőségeinek vizsgálata EHS feladatok megoldásában
In-situ ellipsometric measurements of thin film aluminum oxidation [4099-26]
Optical characterization of doping profiles in silicon [4099-04]