Accurate sizing of deposited PSL spheres from light scatter measurements [4449-19]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Atomic Force Microscopy: AFM helps engineer low-scatter thin films
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Effects of particle shape on particle identification and scatter predictions [4449-18]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
Measurement of the elastic constants of nanometric films [4449-16]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Microroughness analysis of thin film components for VUV applications [4099-13]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
New procedure for the optical characterization of high-quality thin films [4099-16]
Polarized light scattering from metallic particles on silicon wafers [4449-39]
Quasi-confocal extended field surface sensing [4449-23]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Stitching interferometry of aspherical surfaces [4449-34]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
VUV light-scattering measurements of substrates and thin film coatings [5188-14]
X-ray investigations of a near surface layer of metal samples [4099-33]
X-ray study of surfaces and interfaces [4449-31]
X-ray study of the roughness of surfaces and interfaces [4099-12]