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    Atomic Force Microscopy: AFM helps engineer low-scatter thin films

    Duparre, A. / Kaiser, N. | British Library Online Contents | 1998

    Funktionsrelevante Rauheitsanalyse durch kombinative Verfahren

    Duparre,A. / Fraunhofer Inst.f.Angewandte Optik u.Feinmechanik,IOF,Jena,DE | Automotive engineering | 2012

    DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]

    Gliech, S. / Steinert, J. / Flemming, M. et al. | British Library Conference Proceedings | 2000

    Wide-scale surface measurement using white light interferometry and atomic force microscopy [3479-04]

    Recknagel, R.-J. / Feigl, T. / Duparre, A. et al. | British Library Conference Proceedings | 1998

    Characterization procedures for nanorough ultrahydrophobic surfaces with controlled optical matter [5188-30]

    Flemming, M. / Reihs, K. / Duparre, A. et al. | British Library Conference Proceedings | 2003

    Advanced methods for surface and subsurface defect characterization of optical components [4099-34]

    Steinert, J. / Gliech, S. / Wuttig, A. et al. | British Library Conference Proceedings | 2000

    VUV light-scattering measurements of substrates and thin film coatings [5188-14]

    Hultaker, A. / Gliech, S. / Benkert, N. et al. | British Library Conference Proceedings | 2003

    Microroughness analysis of thin film components for VUV applications [4099-13]

    Ferre-Borrull, J. / Duparre, A. / Steinert, J. et al. | British Library Conference Proceedings | 2000

    New procedure for the optical characterization of high-quality thin films [4099-16]

    Bosch, S. / Leinfellner, N. / Quesnel, E. et al. | British Library Conference Proceedings | 2000

    AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]

    Frost, F. / Hirsch, D. / Schindler, A. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Measuring the scatter distribution of PSL spheres on Si wafers using a fast calibrated CMOS photodetector array [4449-20]

    Rinder, T. / Rothe, H. / SPIE | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Diffractive solid immersion lenses: characterization and manufacturing [4449-29]

    Brunner, R. / Bischoff, J. / Rudolf, K. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm [4449-06]

    Boher, P. / Evrard, P. / Piel, J. P. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    X-ray study of surfaces and interfaces [4449-31]

    Asadchikov, V. E. / Bukreeva, I. N. / Duparre, A. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Versatile optical system for static and dynamic thermomagnetic recording using a scanning laser microscope [4449-26]

    Clegg, W. W. / Jenkins, D. F. / Helian, N. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Advantages of a new subnanometer aspheric profiling technique with respect to the unique requirements of EUV lithography mirrors [4449-24]

    Glenn, P. E. / SPIE | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Effects of particle shape on particle identification and scatter predictions [4449-18]

    Ivakhnenko, V. I. / Stover, J. C. / Scheer, C. A. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]

    Weingartner, I. / Schulz, M. / Thomsen-Schmidt, P. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]

    Boher, P. / Bucchia, M. / Piel, J. P. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

    Present and future industrial metrology needs for qualification of high-quality optical microlithography materials (Invited Paper) [4449-01]

    Engel, A. / Morsen, E. / Jordanov, A. et al. | British Library Conference Proceedings | 2001
    Contributors: Duparre, A.

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