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EUV
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laser
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optics
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keywords:(laser generated laboratory EUV optics)
X-ray and EUV spectral instruments for plasma source characterization [5196-32]
Optimizing an EUV source for 13.5 nm [5196-31]
Multi-keV x-ray conversion from prepulsed foil experiments [5196-26]
Efficiency of 1.5- to 4.5-keV x-ray production from laser plasmas [5196-21]
Liquid-metal-jet anode x-ray source [5196-50]
EUV lithography development in Europe: present status and perspectives (Invited Paper) [5196-07]
X-pinch source size measurements [5196-04]
Quasi-monochromatic polycapillary imaging utilizing a computed radiography system [5196-48]
X-ray line spectropolarimetry as a new diagnostic of anisotropic plasma sources [5196-03]
Neutron-pumped excimer flashlamp sources [5196-30]
X-ray radiation of clusters irradiated by ultrafast high-intensity laser pulses [5196-27]
Toward an x-ray laser beamline facility: LASERIX (Invited Paper) [5196-16]
Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]
Status of laser-Compton x-ray generation project for FESTA [5196-18]
Plasma generation and characterization in the extreme ultraviolet spectral range [5196-08]