Atomic Force Microscopy: AFM helps engineer low-scatter thin films
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Microroughness analysis of thin film components for VUV applications [4099-13]
New procedure for the optical characterization of high-quality thin films [4099-16]
X-ray study of the roughness of surfaces and interfaces [4099-12]
X-ray investigations of a near surface layer of metal samples [4099-33]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
X-ray study of surfaces and interfaces [4449-31]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Polarized light scattering from metallic particles on silicon wafers [4449-39]