Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
X-ray study of surfaces and interfaces [4449-31]
Effects of particle shape on particle identification and scatter predictions [4449-18]