The influences of vacuum pressure and gas components on the stability of GaAs photocathode

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The influences of vacuum pressure and gas components on the stability of GaAs photocathode

Wang, Long / Shi, Feng / Cheng, Hongchang / Niu, Sen / Shi, Hongli / Yan, Lei / Cheng, Xing / Yuan, Yuan

The photocurrent attenuation of GaAs photocathode within one hour after activation under three different vacuum pressure (5×10^-9Pa, 5×10^-8Pa, 5×10^-7Pa) were recorded by automatically activated monitor. The results show that: the photocurrent quickly descend in the beginning and then descend linearly at a low slope; the amplitude of the quickly descending area were 10%, 14.74% and 36%separately, with the respective slope of the linear descending area were -0.00653, -0.01132and -0.02. Three samples’ gas components of H₂, CH₄, CO, H₂O, O₂, CO₂ etc under the same vacuum pressure (5×10^-8Pa)during photocurrent attenuation were collected by quadrupole mass spectrometer. By comparing the gas components content and the attenuation law of the photocurrent, it has been found that H₂O and H₂ had a greater impact on the stability of GaAs photocathode in the ultra-high vacuum environment and H₂O was the predominant effect. This paper has important guiding significance and reference value in studying the stability of GaAs photocathode and the improvement of semiconductor photocathode process.

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Title :

The influences of vacuum pressure and gas components on the stability of GaAs photocathode

Contributors:

Wang, Long (author) / Shi, Feng (author) / Cheng, Hongchang (author) / Niu, Sen (author) / Shi, Hongli (author) / Yan, Lei (author) / Cheng, Xing (author) / Yuan, Yuan (author)

Conference:

Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part II ; 2014 ; China,China

Published in:

Proc. SPIE ; 9522

Publication date :

2015-04-13

ISBN :

9781628416534

ISSN :

0277-786X

DOI :

https://doi.org/10.1117/12.2178709

Type of media :

Conference paper