X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9

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X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9 - 13 July 1990, San Diego, Calif.

Society of Photo-optical Instrumentation Engineers

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Title :

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9 - 13 July 1990, San Diego, Calif.

Contributors:

Hoover, Richard B. (editor) / Walker, A. B. C. (editor) / Society of Photo-optical Instrumentation Engineers

Conference:

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography ; 1990 ; San Diego/Calif. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography (San Diego/Calif.) : 1990.07.08-13
International Symposium on Optical and Optoelectronic Applied Science and Engineering ^[Part] ; 1990 ; San Diego
International Symposium on Optical and Optoelectronic Applied Science and Engineering ^[Part] (San Diego) : 1990.07.08-13

Published in:

Proceedings / SPIE ; 1343

Publication date :

1991

Size :

XII, 579 S.

Remarks:

Ill., graph. Darst.
Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x
Includes bibliographical references and index

ISBN :

0819404047

Type of media :

Conference Proceedings

Type of material :

Language :

English

Keywords :

Instruments , Congresses , Coatings , X-ray lithography , X-ray optics , Polarimetry , Extreme ultraviolet lithography

Classification :

DDC:

621.36