Study on thermal control of x-ray mask during post-exposure bake [5253-87]

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Study on thermal control of x-ray mask during post-exposure bake [5253-87]

Wang, Y. / Yu, J. / Yu, L. / Chen, D. / SPIE - The International Society for Optical Engineering

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Title :

Study on thermal control of x-ray mask during post-exposure bake [5253-87]

Contributors:

Wang, Y. (author) / Yu, J. (author) / Yu, L. (author) / Chen, D. (author) / Guangjun, Zhang / Huijie, Zhao / Zhongyu, Wang / SPIE - The International Society for Optical Engineering

Conference:

International symposium; 5th, Instrumentation and control technology

Published in:

Instrumentation and control technology ; 424-428

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING ; 5253

Publication date :

2003-01-01

Size :

5 pages

ISBN :

0819451371

ISSN :

0277-786X

Type of media :

Conference paper

Type of material :

Language :

English

Keywords :

instrumentation , control technology , SPIE , optical engineering

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