2D-area/3D-volume holographic optical storage nanotechnology [4099-22]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Calibration tool for a CCD-camera-based vision system [4099-19]
Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering [4099-30]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Fast-scanning ellipsometry for thin film characterization [4099-39]
In-situ ellipsometric measurements of thin film aluminum oxidation [4099-26]
Investigation on total scattering at 157 nm and 193 nm [4099-09]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
Lithography: a look at what is ahead (Invited Paper) [4099-01]
Microroughness analysis of thin film components for VUV applications [4099-13]
New procedure for the optical characterization of high-quality thin films [4099-16]