New procedure for the optical characterization of high-quality thin films [4099-16]
Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering [4099-30]
Standardization in optics characterization (Invited Paper) [4099-14]
Microroughness analysis of thin film components for VUV applications [4099-13]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
In-situ ellipsometric measurements of thin film aluminum oxidation [4099-26]
Optical characterization of doping profiles in silicon [4099-04]
Investigation on total scattering at 157 nm and 193 nm [4099-09]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
X-ray investigations of a near surface layer of metal samples [4099-33]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Lithography: a look at what is ahead (Invited Paper) [4099-01]