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OPTIK
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keywords:(OPTIK)
Optical constants of sputtered U and a-Si at 30.4 and 58.4 nm [3767-55]
Testing of glancing incidence mirrors using sampled profile measurements (Invited Paper) [3767-16]
Characterization and optimization of a laser-produced x-ray source with a gas puff target [3767-02]
Neutron multilayer structures for fundamental experiments in UCN optics [3767-49]
Progress in the development of three-aspherical mirror optics for EUVL [3767-23]
Refractive x-ray focusing with modified phonograph records [3767-11]
Stability issues in the use of coherent x-rays [5195-16]
Two-dimensional asymmetrical Bragg diffraction for submicrometer computer tomography [5195-09]
Double multilayer monochromator to tailor bending magnet radiation spectrum [5195-23]
Status of XOP: an x-ray optics software toolkit [5536-20]
Control of Mo/Si multilayers for soft x-ray performance [3767-35]
Diffraction geometry optimization with polycapillary x-ray optics [3767-28]
Laterally graded multilayer optics for x-ray analysis [3767-27]
New optoelectronic sensor for measuring biologically effective irradiance [3317-52]
Diffractive investigation of the domain structure in amorphous semiconductors [3317-41]
Laser setup for production of holographic portraits (Abstract Only) [3317-27]
Laterally graded small d-spacing W/C multilayers (Abstract Only) [5195-22]
Influence of crystal surface roughness on the angular spread of x-ray diffracted beam [5195-18]