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OPTIK
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keywords:(OPTIK)
Novel condenser for EUV lithography ring-field projection optics [3767-33]
Review of x-ray collimators for x-ray proximity lithography [3767-24]
Liquid-target laser-plasma sources for EUV and x-ray lithography (Invited Paper) [3767-01]
Experimental test of the de Broglie wave packet nature of the neutron [3767-50]
Curved-crystal three-axis neutron spectrometry with position-sensitive detection [3767-42]
New measurements with a perfect crystal cavity for neutrons [3767-48]
High-power source and illumination system for extreme ultraviolet lithography [3767-20]
Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]
Recent advances in EUV phase-shifting point diffraction interferometry [3767-22]
EUV spectroscopy of ultrafast capillary discharges [3767-52]
High-power x-ray point source for next-generation lithography [3767-03]
Focusing properties of x-ray polymer refractive lenses from SU-8 resist layer [5195-04]
Double gradient multilayers for broadband focusing [5195-01]
Neutron multilayer structures for fundamental experiments in UCN optics [3767-49]