Optimization of RF Magnetron Sputtering Parameters for Deposition of Zinc Oxide Semiconductor Film at Moderate Temperature of 100°C
Optimization of RF Magnetron Sputtering Parameters for Deposition of Zinc Oxide Semiconductor Film at Moderate Temperature of 100°C
- Neue Suche nach: Muthukarappan, Amutha Surabi
- Neue Suche nach: Paramathma, Baskara Sethupathi
- Neue Suche nach: Jeyaseelan, Chandradass
- Neue Suche nach: Park, Seong-Ju
- Neue Suche nach: Muthukarappan, Amutha Surabi
- Neue Suche nach: Paramathma, Baskara Sethupathi
- Neue Suche nach: Jeyaseelan, Chandradass
- Neue Suche nach: Park, Seong-Ju
Zinc oxide semiconductor thin films are deposited on glass substrate at different RF magnetron sputtering parameters. The deposited films were characterized as a function of substrate - target distance, gas flow ratio, working pressure and RF power. X-ray diffraction, Field emission scanning electron microscopy, and hall measurement were utilized to analyze the effect of the deposition condition on the structure, surface morphology and electrical properties of ZnO thin films. The deposition conditions were optimized to give good quality films suitable for the application of flexible or invisible flat panel display. All the films were deposited at 100°C.
Dokumentinformationen
Optimization of RF Magnetron Sputtering Parameters for Deposition of Zinc Oxide Semiconductor Film at Moderate Temperature of 100°C
Sae Technical Papers
International Conference on Advances in Design, Materials, Manufacturing and Surface Engineering for Mobility ; 2019
2019-10-11
Aufsatz (Konferenz)
Englisch
Optimization , Semiconductors , Emissions , Pressure , Gases , Microscopy , Glass
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