Narrow-band holographic optical filter using thick efficient holographic gratings

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Narrow-band holographic optical filter using thick efficient holographic gratings

Billmers, Richard I. / Billmers, Elizabeth J. / Burzynski, Ryszard / Weibel, John F. / Heverley, L. H. / Casstevens, Martin K. / Curran, Thomas P. / Contarino, V. Michael

Abstract

RL Associates in conjunction with Hybrid Technologies is developing a narrow linewidth optical filter employing extremely thick volume holographic diffraction gratings. The gratings are written in MEMPLEX, a new holographic materia invented by Laser Photonics Technology, Inc. and licensed to Hybrid Technologies. MEMPLEX has the following characteristics: (1) Excellent optical clarity, (2) Preparable at any thickness up to 10 mm, (3) Large dynamic range for plane wave holograms, (4) Hard, freestanding, stable, polishable and coatable. We have written and characterized numerous gratings in 1.8 mm thick samples to study the effect of writing geometry on the spectral linewidth and field-of-view of a single grating in the reflection geometry. We have succeeded in writing some very efficient gratings at 15 degrees internal write angles with external slant angles of 5 degrees. These gratings exhibit linewidths of < 0.2 nm and diffraction efficiencies of better than 70 percent. The measured angular acceptance of these gratings ranges from 0.1 to 0.24 degrees. We have also written some initial angle multiplexed gratings which include 3 efficient gratings in the same volume in an attempt to increase the angular acceptance. In this manner we hope to achieve a highly efficient optical filter with extremely narrow spectral linewidth and wide angular acceptance. Filters based on thick volume holograms show great promise in Lidar applications and should result in superior S/N ratios.

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Dokumentinformationen

Titel :

Narrow-band holographic optical filter using thick efficient holographic gratings

Beteiligte:

Billmers, Richard I. (Autor:in) / Billmers, Elizabeth J. (Autor:in) / Burzynski, Ryszard (Autor:in) / Weibel, John F. (Autor:in) / Heverley, L. H. (Autor:in) / Casstevens, Martin K. (Autor:in) / Curran, Thomas P. (Autor:in) / Contarino, V. Michael (Autor:in)

Kongress:

Practical Holography XVI and Holographic Materials VIII ; 2002 ; San Jose,California,United States

Erschienen in:

Proc. SPIE ; 4659

Erscheinungsdatum :

2002-06-03

ISBN :

9780819443991

ISSN :

0277-786X

DOI :

https://doi.org/10.1117/12.469262