The invention relates to magnetic filter plasma source equipment for simulating an ionized layer environment. The equipment comprises a vacuum chamber, and a filament supporting electrode, a magnetic field array and a metal baffle plate which are arranged in the vacuum chamber, the filament supporting electrode is used for installing a hot filament; the metal baffle is arranged in the vacuum chamber and close to the middle position of the vacuum chamber outlet; the magnetic field array comprises a plurality of groups, one group is installed on the metal baffle and used for forming a magnetic filter configuration, and the other groups form a multi-pole magnetic field configuration. Uniformly distributed plasmas with the thickness of 105cm <-3 > and the thickness of 20cm can be realized through the equipment, the electron energy and the ion energy of the plasmas are very close to those of a real ionosphere environment, and the equipment has important significance for realizing space ionosphere load ground calibration and ionosphere physical ground simulation research.

    本发明涉及一种用于模拟电离层环境的磁滤等离子体源设备,所述设备包括真空室,以及设置于所述真空室内的灯丝支撑电极、磁场阵列和金属挡板;所述灯丝支撑电极用于安装热灯丝;所述金属挡板设置于真空室内靠近真空室出口的中部位置;所述磁场阵列包括多组,其中一组安装在所述金属挡板上,用于构成一个磁滤位形,其余组构成了一个多极磁场位形。通过该设备能够实现低至105cm‑3且厚度达20cm的均匀分布等离子体,并且等离子体电子、离子能量都非常接近真实电离层环境,对实现空间电离层载荷地面标定和电离层物理地面模拟研究具有重要意义。


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    Titel :

    Magnetic filter plasma source equipment for simulating ionized layer environment


    Weitere Titelangaben:

    一种用于模拟电离层环境的磁滤等离子体源设备


    Beteiligte:
    LIU YU (Autor:in) / LI MINCHI (Autor:in) / LEI JIUHOU (Autor:in) / YU PENGCHENG (Autor:in)

    Erscheinungsdatum :

    2023-05-26


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Chinesisch


    Klassifikation :

    IPC:    H05H Plasmatechnik , PLASMA TECHNIQUE / B64G Raumfahrt , COSMONAUTICS



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