Differential sputtering yield measurement of ion grid materials by novel arch array system

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Differential sputtering yield measurement of ion grid materials by novel arch array system

He, Zihao / Miao, Long / Zhu, Zhengxi / Yang, Tongxun / Wang, Ningfei / Hou, Xiao

Abstract In this experimental study the differential sputtering yield and total sputtering yield of ion thruster grid materials (Mo and C/C composite) under low-energy ion bombardment has been investigated. A novel combinable aluminum arch array is developed to determine the spatial distributions of sputtered atoms in different azimuthal angles. The quartz crystal microbalance (QCM) method is used to validate the typical distribution profile of sputtered atoms at the 180° azimuthal angle. The distribution characteristics of sputtered atoms as well as the specific regions of maximum differential sputtering yield under different incident energies, incident angles and ion species (Xe, Kr, Ar) have been discussed. The sputtering resistance performance of C/C composite materials have been compared with Mo metal by measuring the total sputtering yield. The spatial distributions of C/C differential sputtering yield are found highly anisotropic even under normal incidence, a multi-region discontinuous distribution characteristic of maximum differential sputtering yield have been observed in C/C composite material. The experimental results about the spatial distribution of sputtered atoms are of great importance for establishing the sputter-redeposition models of grid apertures to accurately predict the evolution of grid morphology and lifetime of ion thruster.

Highlights • Incident ion species affect differential sputter yield distribution profiles. • Incident energies affect distribution range of maximum differential sputter yield. • Ejection angle range of ymax is not depending on the incident angles. • Sputtrer distribution profiles of C/C material is highly anisotropic.